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Latest update: 15/09/2022 12:22:14

Tsubasa Vacuum RIKEN Co., Ltd.

By utilizing our own vacuum deposition technology, we solve clients' problems.

We have been involved in the semiconductor industry for many years. During the period, we have established vacuum deposition technology for protecting dry etching equipment parts from fluorine plasma. The technology is expected to increase the operating time of dry etching equipment, improve the production yield, and reduce maintenance costs.

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Having excellent corrosion resistance to fluorine plasma and greatly contributing to particle reduction
Yttrium oxide film with a thickness of 10μm
A film with highly precisely formed atoms can be made. A thick film made with an ion assisted vapor deposition method is more advantageous than a film made with a sputtering method and is optimum as protection film for dry etching equipment.
Yttrium oxide fluoride film
A film with highly precisely formed atoms can be made. A thick film made with an ion assisted vapor deposition method is more advantageous than a film made with a sputtering method and is optimum as protection film for dry etching equipment. In addition, since the thick film can shorten aging time, it contributes to productivity improvement.
A film can be formed on alumina, aluminum, and quartz substrates!
Considering the thermal expansion coefficients of the substrates, we add a foundation layer and a stress relaxation layer. We have the optimum film formation solutions. 

Catalogue/Pamphlet/Proposed

Y2O3成膜_product_brochure.改.pdf

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