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Latest update： 03/04/2020 16:49:20

CV Research Corporation 

We realize various seeds for customers engaged in semiconductors.

We develop, manufacture and sell semiconductor manufacturing equipment using high-density plasma such as the CVR-9300 Series and CVR-9000 Series. We also provide services such as surface treatment and film formation

Inquiry
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Sales Pitch

Semiconductor manufacturing equipment 
CVR-9300 Series
Platform for handling wafers of diameter 12″ (300mm)
Process reactor for large-diameter wafers
CVR-9000 Series
A platform for handling wafers of diameter 5″ to diameter 8″
High-density, uniform plasma enables stable processing
CVR-3000 SR
Single platform for handling wafers of diameter 5″ to diameter 8″ and square masks of 152mm
Simple structure without load lock
Small footprint and high cost performance
CVR-3000 WD
Dry and wet combination platform for wafers of diameter 12″
Processing from resist ashing to wet RCA cleaning is possible. 
Enables reverse side cleaning, in awareness of cross-contamination.
Services 
Surface treatment services
Processing size: Surface treatment services for wafers of diameter 6 to 8 inches
* Chip processing is possible by using a diameter 8 inch Si tray
* Partly compatible with wafers of diameter 300mm
Types of processing: Oxidation, nitriding, ashing
Deposition service
Processing size: Deposition service for wafers of diameter 6 to diameter 8 inches
* Chip processing is possible by using a diameter 8 inch Si tray
Film type: TaO, AlO, SiO, SiN
Film thickness: About 1 nm to 1000 nm (depending on the conditions)

This company is recommended by the following support organizations.

Marketing Support Department, SMRJ
Inquiry

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