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Latest update： 03/04/2020 16:49:20
CV Research Corporation
We realize various seeds for customers engaged in semiconductors.
We develop, manufacture and sell semiconductor manufacturing equipment using high-density plasma such as the CVR-9300 Series and CVR-9000 Series. We also provide services such as surface treatment and film formation
- Semiconductor manufacturing equipment
Platform for handling wafers of diameter 12″ (300mm) Process reactor for large-diameter wafers
A platform for handling wafers of diameter 5″ to diameter 8″ High-density, uniform plasma enables stable processing
Single platform for handling wafers of diameter 5″ to diameter 8″ and square masks of 152mm Simple structure without load lock Small footprint and high cost performance
Dry and wet combination platform for wafers of diameter 12″ Processing from resist ashing to wet RCA cleaning is possible. Enables reverse side cleaning, in awareness of cross-contamination.
Surface treatment services
Processing size: Surface treatment services for wafers of diameter 6 to 8 inches * Chip processing is possible by using a diameter 8 inch Si tray * Partly compatible with wafers of diameter 300mm Types of processing: Oxidation, nitriding, ashing
Processing size: Deposition service for wafers of diameter 6 to diameter 8 inches * Chip processing is possible by using a diameter 8 inch Si tray Film type: TaO, AlO, SiO, SiN Film thickness: About 1 nm to 1000 nm (depending on the conditions)
This company is recommended by the following support organizations.
- Marketing Support Department, SMRJ