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Latest update: 22/11/2017 02:06:14

Kisou Seichou Co., Ltd.

We are an R&D company capable of developing raw materials that are not available anywhere in the world.

Chemical vapor deposition is an evaporation method for forming thin films made of various substances. We have confidence in our technology related to this method. We are conducting R&D for new chemical vapor deposition equipment that can complete an experiment in a short period from raw material and process screening to high-precision deposition. We are also developing raw materials for new chemical vapor deposition. We can develop raw materials that are not available anywhere in the world. We have strong connections with universities and research institutes and also a process development network. About two-thirds of our staff have doctorates.



Corporate name Kisou Seichou Co., Ltd.
Representative Hideaki Machida
Corporate website
Capital 4,500,000(JPY)
Number of Employees 3
Established date 2008
Head office: Country Japan
Head office: Address Tamakoganei venture port 301, University of Agriculture and Technology, 2-24-16, Nakamachi, Koganei, Tokyo, 184-0012
Industry Specialized business services except elsewhere classified
Main phone number +81-424011783