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Latest update： 22/11/2017 02:06:14
Kisou Seichou Co., Ltd.
We are an R&D company capable of developing raw materials that are not available anywhere in the world.
Chemical vapor deposition is an evaporation method for forming thin films made of various substances. We have confidence in our technology related to this method. We are conducting R&D for new chemical vapor deposition equipment that can complete an experiment in a short period from raw material and process screening to high-precision deposition. We are also developing raw materials for new chemical vapor deposition. We can develop raw materials that are not available anywhere in the world. We have strong connections with universities and research institutes and also a process development network. About two-thirds of our staff have doctorates.
Overview
| Corporate name | Kisou Seichou Co., Ltd. |
|---|---|
| Representative | Hideaki Machida |
| Corporate website | http://www.kisoh-seicho.com |
| Capital | 4,500,000(JPY) |
| Number of Employees | 3 |
| Established date | 2008 |
| Head office: Country | Japan |
| Head office: Address | Tamakoganei venture port 301, University of Agriculture and Technology, 2-24-16, Nakamachi, Koganei, Tokyo, 184-0012 |
| Industry | Specialized business services except elsewhere classified |
| Main phone number | +81-424011783 |
