Corporate
Profile

Failed to register as Favorite Page
Failed to cancel as Favorite Page
This page is already registered as a Favorite Page
You can't add your company to your favorites.

Latest update: 11/05/2021 01:20:52

Novelion Systems Co., Ltd.

We offer a device that works semi-permanently to diffuse high-density plasma.

We developed a plasma generator that can generate high-density, low-impurity plasma for surface-modifying apparatuses with plasma and micro machine devices. Our attachment-type ECR plasma source does not require sophisticated operation techniques. It diffuses high-density plasma without accumulation, so a large processing unit can be configured by attaching it to an empty port of a vacuum chamber. 

Inquiry

[Product description] [Merit] - Extra large volume ECR region by original magnet structure. - Easy coaxial cable connection for microwave. - Metal contamination free. - Compact module concept for the plural applying. [Detail] - Vacuum port size : 80 mm dia. - Microwave connection : Type N - Microwave frequency : 2.45 GHz - Maximum Power : 200 W - Cooling : water. [Applications] - Etching or Ashing systems. - Reactive ion beam etching systems. - Ion nitriding or oxidizing systems. - DLC coating systems.

[Product description] [Merit] - All metal seal for ultra high vacuum systems. - Easy coaxial cable connection for microwave. - Radical beam productions by dielectric extraction grid. [Detail] - Vacuum port size : ICF-70 - Microwave connection : Type N - MIcrowave frequency : 2.45 GHz - Maximum power : 150 W - Cooling : water [Application] - Oxigen / nitrogen radical beam sources for MBE systems. - Atomic hytrogen beam sources for surface cleanings.

[Product description] [Merit] - Good beam uniformity by means of charged particle orbit simulations. - Low energy and ampere current ion beams are produced by using electrodes of refractory and low-sputter materials. [Detail] - Discharge method : Multi-cusp confinement, DC (ECR) discharge. - Beam diameter : 350 mm - Beam spec. : 1keV x 2A [Application] - MEMS milling processes.

[Product description] [Merit] - Extra large volume ECR region by original magnet structure. - Capability of high power operations by excellent cooling systems. - Metal contamination free. - Compact module concept for the plural applying. [Detail] - Vacuum port size : 120 mm dia. - Wave guide size : WR340 - Microwave frequency : 2.45 GHz - Maximum Power : 2000 W - Cooling : water. [Applications] - Etching or ashing systems. - Reactive ion beam etching systems. - Ion nitriding or oxidizing systems. - DLC coating systems. [Intellectual property] Application number: Patent Application 2014-28950

Inquiry

Similar Companies