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Latest update: 11/05/2021 01:20:52

Novelion Systems Co., Ltd.

We offer a device that works semi-permanently to diffuse high-density plasma.

We developed a plasma generator that can generate high-density, low-impurity plasma for surface-modifying apparatuses with plasma and micro machine devices. Our attachment-type ECR plasma source does not require sophisticated operation techniques. It diffuses high-density plasma without accumulation, so a large processing unit can be configured by attaching it to an empty port of a vacuum chamber. 

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[Company strength]
We can set up an advanced electromagnetic field simulation and measuring environment, and optimize every part of the components to create an extremely powerful yet compact plasma source. All parts are precision-made in our partner plant and then assembled in a clean environment to maintain high product quality. 
This is why our products have been adopted by national laboratories and major semiconductor equipment manufacturers.

[Business description]
We mainly develop plasma generators that can generate high-density, low-impurity plasma for surface-modifying apparatuses with plasma and micro machine devices. 
We have commercialized a version of an attachment-type ECR plasma source that does not require sophisticated operation techniques or know-how.
We also make custom-made plasma devices with our attachment-type ECR plasma source. 

[Industry]
Vacuum device manufacturing

[Strength of products/technologies]
Our attachment-type ECR plasma source does not have any consumables in its gas pipe connection part. It works semi-permanently even in active atmospheres such as oxygen and halogen.
It diffuses high-density plasma without accumulation, so a large processing unit can easily be made by attaching it to an empty port of a large vacuum chamber.
We are currently receiving product inquiries from various industries, ranging from semiconductor equipment manufacturing and micromachining to ion beam radiotherapy. 

[Representative's message]
I started my company as a semiconductor development engineer. We have focused our resources on developing unique technologies through industry-university collaboration with Doshisha University ever since.
The resulting product is our attachment-type ECR plasma source. We will send it out into the world so that we can contribute to the development of next-generation semiconductor processing and surface reforming.
We will demonstrate our value as your partner in technology development. 

[Company structure for market development/overseas expansion]
We have established a fully working supply network with our knowledge of vacuum equipment and semiconductor processing units. We can meet demands from either domestic or overseas customers.

[Awards and media coverage]
[Awards]
2007: New Business Subsidy; Regional Development Award.

[Media]
Semiconductor Industry News (August 15, 2007)

[Joint research and development]
Independent Administrative Institution Japan Atomic Energy Agency (JAEA), Doshisha University, and others.

[Transaction form]
Prototype development orders, OEM contracts, product sales.

[Main Clients / Business History (domestic)]
A major metalworking manufacturer (consigned manufacturing, since 2009) and a semiconductor manufacturing apparatus manufacturer (design by consignment, since 2008).

This company is recommended by the following support organizations.

Kansai Head Office, SMRJ
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